ti.\*:("MicroProcess")
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MicroProcessAOYAGI, Katsunobu; ATODA, Nobufumi; NAKAMURA, Moritaka et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, issn 0021-4922, 465 p., 1Conference Proceedings
MicroProcessAOYAGI, Yoshinobu; ATODA, Nobufumi; SUZUKI, Katsumi et al.Japanese journal of applied physics. 1996, Vol 35, Num 12B, issn 0021-4922, 354 p., 1Conference Proceedings
Nanofabrication for quantum devicesKERN, D. P; LEE, K. Y; RISHTON, S. A et al.Japanese journal of applied physics. 1992, Vol 31, Num 12B, pp 4496-4500, issn 0021-4922, 1Article
Microprocessing at the fingertipsTHORNELL, G; JOHANSSON, S.Journal of micromechanics and microengineering (Print). 1998, Vol 8, Num 4, pp 251-262, issn 0960-1317Article
Microprocesses and nanotechnologyAOYAGI, Yoshinobu; ATODA, Nobofumi; SAMUKAWA, Seiji et al.Japanese journal of applied physics. 1997, Vol 36, Num 12B, issn 0021-4922, 341 p., 1Conference Proceedings
Bacterial microprocessingBERG, H. C.Cold Spring Harbor symposia on quantitative biology. 1990, Vol 55, pp 539-545, issn 0091-7451Article
MICROPROCESSES IN COAGULATIONLICSKO I.1976; WAT. RES.; G.B.; DA. 1976; VOL. 10; NO 2; PP. 143-147; BIBL. 13 REF.Article
Single atom lithography and its applicationsWOODHAM, R. G; AHMED, H.Japanese journal of applied physics. 1996, Vol 35, Num 12B, pp 6683-6688, issn 0021-4922, 1Conference Paper
Dependence of defects in optical lithographyHAM, Y. M; HUR, I. B; KIM, Y. S et al.Japanese journal of applied physics. 1992, Vol 31, Num 12B, pp 4137-4142, issn 0021-4922, 1Article
Flash technology : Challenges and opportunitiesGIRIDHAR, R. V.Japanese journal of applied physics. 1996, Vol 35, Num 12B, pp 6347-6350, issn 0021-4922, 1Conference Paper
Present and future trends in microlithographyPEASE, R. F.Japanese journal of applied physics. 1992, Vol 31, Num 12B, pp 4103-4109, issn 0021-4922, 1Article
Simulation of chemical amplification resistsYOSHINO, H; MATSUMOTO, H.Japanese journal of applied physics. 1992, Vol 31, Num 12B, pp 4283-4287, issn 0021-4922, 1Article
Microprocesses of metal dusting on ironPIPPEL, E; WOLTERSDORF, J; GRABKE, H. J et al.Steel research. 1995, Vol 66, Num 5, pp 217-221, issn 0177-4832Article
MICROPROCESSING SYSTEMS APPLICATIONS.1975; IN: WORKSHOP MICROARCHIT. COMPUT. SYST. PREPR.; NICE; 1975; AMSTERDAM; NORTH-HOLLAND; DA. 1975; PP. 157-181; BIBL. DISSEM.Conference Paper
Microprocesses in perception and personalityLILJA, A; SMITH, G. J. W; SALFORD, L. G et al.The Journal of nervous and mental disease. 1992, Vol 180, Num 2, pp 82-88, issn 0022-3018Article
Computerisation and microprocessing within urologyGLEN, E. S.British journal of urology (Print). 1987, Vol 60, Num 6, pp 588-589, issn 0007-1331Article
MICROPROCESSING WHATS IN IT FOR THE RUBBER INDUSTRY.BESSANT J.1979; EUROP. RUBB. J.; GBR; DA. 1979; VOL. 161; NO 9; PP. 30-62; (2 P.)Article
THE TRUE COSTS OF MICROPROCESSING.COSSERAT D.1978; MICROPROCESSORS; G.B.; DA. 1978; VOL. 2; NO 3; PP. 115-118Article
Fluoride glasses for 193 nm opticsTORATANI, H; ZOU, X; MATSUMOTO, Y et al.Japanese journal of applied physics. 1996, Vol 35, Num 12B, pp 6351-6355, issn 0021-4922, 1Conference Paper
Coulomb interaction effect in cell projection lithographyYAMASHITA, H; TAMURA, T; NOMURA, E et al.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6684-6688, issn 0021-4922, 1Conference Paper
Recent developments for sub-quarter micrometer fabricationROUSSEAUX, F; HAGHIRI-GOSNET, A. M; CHEN, Y et al.Japanese journal of applied physics. 1992, Vol 31, Num 12B, pp 4520-4524, issn 0021-4922, 1Article
Scratch lithography of 10 nm silicon structuresTADA, T; KANAYAMA, T.Japanese journal of applied physics. 1995, Vol 34, Num 12B, pp 6947-6949, issn 0021-4922, 1Conference Paper
Advances in chemical amplification resist systemsITO, H.Japanese journal of applied physics. 1992, Vol 31, Num 12B, pp 4273-4282, issn 0021-4922, 1Article
An approach for nanolithography using electron holographyOGAI, K; MATSUI, S; KIMURA, Y et al.Japanese journal of applied physics. 1993, Vol 32, Num 12B, pp 5988-5992, issn 0021-4922, 1Conference Paper
Investigation of hydrogen plasma etched Si surfacesISHII, M; NAKASHIMA, K; TAJIMA, I et al.Japanese journal of applied physics. 1992, Vol 31, Num 12B, pp 4422-4427, issn 0021-4922, 1Article